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inspection and measurement used in backlight unit industry as well as panel and instrument industry
For this purpose
SEMI M1-0997 (technical revision)
SEMI M61 — Specification for Silicon Epitaxial Wafers with Buried Layers
MF067100 - SEMI MF671 - Test Method for Measuring Flat Length on Wafers of Silicon and Other Electronic Materials Revision:SEMI MF671-0707 - Superseded inspection and measurement used inThis Test Method covers techniques for determination of the length of the flatted portion of a wafer periphery. This Test Method is intended primarily for use on electronic materials in the form of nominally circular edge contoured wafers with flat lengths up to 65 mm. The precision of this Test Method has been established directly only for silicon wafers, but it is not expected to be material dependent. This Test Method is suitable for referee
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US$ 2450.00